| 发明名称 |
ETCHING IMAGE FORMATION METHOD |
| 摘要 |
PURPOSE:To reproduce a complicated pattern precisely in a simple process by using inorganic high molecular carbon fluorides on a base consisting of SiO2 containing glassy materials as a main component. |
| 申请公布号 |
JPS51123643(A) |
申请公布日期 |
1976.10.28 |
| 申请号 |
JP19750048411 |
申请日期 |
1975.04.21 |
| 申请人 |
CANON KK |
发明人 |
OOTA NORIYA;TOGANOO SHIGEO |
| 分类号 |
B41M5/26;G03C5/56;G03F7/004 |
主分类号 |
B41M5/26 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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