发明名称 MAGNETO-RESISTANCE EFFECT ELEMENT AND MAGNETIC MEMORY
摘要 <p><P>PROBLEM TO BE SOLVED: To reduce a current flow required for spin transfer writing. <P>SOLUTION: The magneto-resistance effect element comprises: a first fixed magnetization layer 4 with a fixed magnetization direction; a free magnetization layer 6 with a variable magnetization direction; a tunnel barrier layer 5 formed between the first fixed magnetization layer and a free magnetization layer; a second fixed magnetization layer 8 which is formed on the opposite side of the free magnetization layer from the tunnel barrier layer and has its magnetization direction fixed in a direction nearly antiparallel with the magnetization direction of the first fixed magnetization layer; and a non-magnetic layer 7 formed between the free magnetization layer and the second fixed magnetization layer. If the second fixed magnetization layer is formed of a ferromagnetic material containing Co, a material containing at least one element selected from Zr, Hf, Rh, Ag, and Au is used for the non-magnetic layer; if the second fixed magnetization layer is formed of a ferromagnetic material containing Fe, a material containing at least one element selected from Rh, Pt, Ir, Al, Ag, and Au is used for the non-magnetic layer; and if the second fixed magnetization layer is formed of a ferromagnetic material containing Ni, a material containing at least one element selected from Zr, Hf, Au, and Ag is used for the non-magnetic layer. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2006269530(A) 申请公布日期 2006.10.05
申请号 JP20050082219 申请日期 2005.03.22
申请人 TOSHIBA CORP 发明人 IGUCHI TOMOAKI;SAITO YOSHIAKI;SUGIYAMA HIDEYUKI
分类号 H01L43/10;C22C19/03;C22C19/07;C22C38/00;H01F10/08;H01F10/12;H01F10/16;H01F10/30;H01L21/8246;H01L27/105;H01L43/08 主分类号 H01L43/10
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