发明名称 PATTERN FORMING METHOD, METHOD OF MANUFACTURING ORGANIC FIELD EFFECT TRANSISTOR, AND METHOD OF MANUFACTURING FLEXIBLE PRINTED CIRCUIT BOARD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a pattern forming method capable of surely solving a problem of difficulty in obtaining a desired pattern as a result of existence of coating liquid or pooled coating liquid due to the effect of the gravity, up to a region wherein the coating liquid should not substantially be in existence. <P>SOLUTION: A nozzle 12 for coating the coating liquid is arranged under a substrate 30, and the nozzle 12 and the substrate 30 are relatively moved while the side of the substrate 30 whose wettability is controlled is directed downward so as to allow the coating liquid 21 to land on the desired region of the substrate 30. Thereafter, the coating liquid 21 is dried and a pattern composed of a coating liquid drying layer is obtained. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2006269599(A) 申请公布日期 2006.10.05
申请号 JP20050083456 申请日期 2005.03.23
申请人 SONY CORP 发明人 NOMOTO AKIHIRO
分类号 H05K3/10;H01L21/027;H01L21/336;H01L29/786;H01L51/05 主分类号 H05K3/10
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