发明名称 COLLECTING METHOD AND COLLECTING UNIT OF PARTICLES, AND SUBSTRATE TREATMENT APPARATUS INCLUDING THE SAME
摘要 A particle collecting method and a particle collecting unit, and a substrate treatment apparatus including the same are provided to prevent particles from being attached at an inner wall of an exhaust line, and to prevent corrosion and pressure drop of the exhaust line. An exhaust line(280) is connected to a process chamber(100a) to exhaust gas. A collecting unit is connected to the exhaust line, and collects particles contained in the gas. A collector is installed within the exhaust line, and comprises an incoming hole for particles. A collecting line is connected to the collector, and extended to the outside of the exhaust line by penetrating the exhaust line.
申请公布号 KR100784392(B1) 申请公布日期 2007.12.11
申请号 KR20070006643 申请日期 2007.01.22
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, KI SU;KIM, JUNG HYEON
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
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