发明名称 |
Standard member for length measurement, method for producing the same, and electron beam length measuring device using the same |
摘要 |
This invention provides an electron beam length measuring technology including a standard component for length measurement that has a finer standard dimension, and its producing method. The standard component for length measurement has a semiconductor member on which is arranged a pattern consisting of an array of first diffraction gratings whose pitch dimension is specified as an absolute dimension by an optical measurement method, wherein the pattern has a structure in which an array of second diffraction gratings different from the first diffraction gratings is arranged in a portion within the array of the first diffraction gratings in a predetermined cycle. Each one of the first diffraction gratings and the second diffraction gratings has a predetermined length and a predetermined width, respectively. The first diffraction gratings and the second diffraction gratings are arranged cyclically at respective predetermined intervals, and marks for specifying positions of the above-mentioned patterns are arranged in peripheral portions of the above-mentioned patterns. Moreover, the above-mentioned pattern contains an array pattern whose minimum pitch dimension is equal to or less than 100 nm. The electron beam batch exposure method is used as a pattern producing method.
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申请公布号 |
US7365306(B2) |
申请公布日期 |
2008.04.29 |
申请号 |
US20030544668 |
申请日期 |
2003.04.28 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
NAKAYAMA YOSHINORI |
分类号 |
G01N23/00;G01B15/00;G21K7/00;H01J37/20;H01J37/28 |
主分类号 |
G01N23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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