发明名称 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a liquid immersion lithographic apparatus, in which the temperature gradient during liquid immersion is reduced or averted. <P>SOLUTION: The liquid immersion lithographic apparatus, arranged in a space wherein one or a plurality of liquid distributors are enclosed by a liquid confinement structure, is released. The function of the liquid distributor is to prevent the formation of one or a plurality of recycle zones which often produce changes in the refractive index of the immersion liquid in the space or, as a result, sometimes produce map error. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009088551(A) 申请公布日期 2009.04.23
申请号 JP20080306642 申请日期 2008.12.01
申请人 ASML NETHERLANDS BV 发明人 LIEBREGTS PAULUS MARTINUS MARIA;JACOBS JOHANNES HENRICUS WILHELMUS;UITTERDIJK TAMMO
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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