| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resist for making up a plate which does not generate an erroneous actuation in an autofocus mechanism based on double reflection between reflection from the surface of a photosensitive film and reflection passing and returning through the photosensitive film of a laser with a wave length of 670 nm for measuring a distance between a roll to be made up and a semiconductor laser head. SOLUTION: The photosensitive resist for making up a plate is incorporated with a coloring matter which exhibits the maximum photosensitivity to a laser with a wave length of 830 nm and is sensitized by on-off irradiation of the laser to be able to draw a positive or negative latent image and is not sensitized by a laser with a wave length of 670 nm and absorbs the laser with a wave length of 670 nm. |
