发明名称 Detection apparatus and exposure apparatus using the same
摘要 A wavelength shift generated by the manufacturing error of an alignment scope is corrected and adjusted to minimize generation of another aberration and enable high-precision position detection. The alignment scope has a detection system (4) for detecting a position detection mark on a wafer (6) to be detected at a predetermined magnification by using light emitted by a light source (401). The detection system (4) incorporates two wedge optical members (410a, 410b) which constitute a wedge optical member group (410). The two wedge optical members are arranged such that their adjacent wedge surfaces are inclined at a predetermined angle in a direction perpendicular to the detection optical axis, and these adjacent wedge surfaces become parallel to each other. The interval between the wedge optical members (410a, 410b) is adjusted to correct the wavelength-dependent position shift amount of the detection system (4).
申请公布号 US2002097386(A1) 申请公布日期 2002.07.25
申请号 US20010988583 申请日期 2001.11.20
申请人 MISHIMA KAZUHIKO 发明人 MISHIMA KAZUHIKO
分类号 G01B11/00;G02B5/30;G02B13/24;G02B19/00;G03B27/54;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03B27/54 主分类号 G01B11/00
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