发明名称 |
Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby |
摘要 |
In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield means are fixed to the mask holder rather than the mask.
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申请公布号 |
US2002096647(A1) |
申请公布日期 |
2002.07.25 |
申请号 |
US20010972204 |
申请日期 |
2001.10.09 |
申请人 |
ASM LITHOGRAPHY B.V. |
发明人 |
MOORS JOHANNES HUBERTUS JOSEPHINA;BANINE VADIM YEVGENYEVICH;LEENDERS MARTINUS HENDRIKUS ANTONIUS;WERIJ HENRI GERARD CATO;VISSER HUGO MATTHIEU;HEERENS GERRIT-JAN;HAM ERIK LEONARDUS;MEILING HANS;LOOPSTRA ERIK ROELOF;DONDERS SJOERD NICOLAAS LAMBERTUS |
分类号 |
G03F1/14;G03F7/20;H01L21/027;H01L21/673;H01L21/677;(IPC1-7):A61N5/00;G21G5/00 |
主分类号 |
G03F1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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