| 摘要 |
Silicon carbide-based bodies are produced by forming a porous compact of silicon carbide, a carbide of a metal, and carbon, and infiltrating the compact with a molten mixture comprising the metal and silicon. The metal may be selected from: titanium, zirconium, hafnium, molybdenum, niobium, tantalum, tungsten, and vanadium, and the infiltration temperature may be between 1900 DEG C and 2100 DEG C. |
