发明名称 Method for making a semiconductor device having an anhydrous ferroelectric thin-film in an oxygen-containing ambient
摘要 A method for making a semiconductor device having an anhydrous ferroelectric thin-film obtained from an anhydrous sol-gel solution. An anhydrous PZT sol-gel solution is provided, wherein the sol-gel solution is prepared from lead (II) acetate anhydrous, which is heated with zirconium and titanium precursors to form a gel. The sol-gel solution is prepared without hydrolyzing the solution to obtain precursor complexes which do not contain water. The sol-gel is then applied to a semiconductor substrate and crystallized to form a ferroelectric thin-film. In a preferred embodiment, one or more steps of preparing the sol-gel solution, applying the sol-gel solution, and crystallizing the sol-gel solution are carried out in the presence of an oxygen-containing ambient.
申请公布号 US5391393(A) 申请公布日期 1995.02.21
申请号 US19930108278 申请日期 1993.08.19
申请人 MOTOROLA, INC. 发明人 MANIAR, PAPU D.
分类号 H01L27/10;C23C18/12;H01L21/8242;H01L21/8246;H01L27/105;H01L27/108;H01L41/22;H01L41/24;(IPC1-7):B05D5/12 主分类号 H01L27/10
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