| 摘要 |
A waterless lithographic plate precursor comprises a light-sensitive composition including an acid generating compound, which when exposed to light yields an acid, and a polymer with hydroxy functional groups, all on an aluminium plate. The composition also includes a silyl ether of formula (I) Rf-(Y)-(X)-R5-Si(OR1)(OR2)(OR3) (I), where Rf = 3-10 C fluoroaliphatic group; Y = O, SO2, carbonyl or a direct link; X =- NR4 or a direct link; R4 = H or /~6 C alkyl; R1=R3 = /~6 C alkyl groups; and R5 = /~6 C alkyl group. Also claimed is a method of producing a waterless lithographic plate. |
