发明名称 DEVICE AND METHOD FOR EXPOSURE AND STORAGE MEDIUM RECORDING PROGRAM
摘要 PROBLEM TO BE SOLVED: To provide an exposure device and an exposure method by which resolution and a throughput are made compatible and the various kinds of devices such as the high-performance liquid crystal display device can be inexpensively manufactured and to provide a storage medium recording the program. SOLUTION: This exposure device is provided with such special constitution that one substrate stage 16 is shared by two exposure optical system 12 and 14 having mutually different resolution. The optical system 12 and 14 are constituted so that not only the resolution thereof are different but also the shot-size thereof, that means, the areas which can be exposed at a time are different. That means, trade-off relation is generally established between the resolution and the shot-size of the exposure optical system. Therefore the shot-size of the optical system having the high resolution is small and that of the optical system having the low resolution is large. By respectively utilizing these characteristics, precise exposure processing can be executed with the high throughput.
申请公布号 JP2000284492(A) 申请公布日期 2000.10.13
申请号 JP19990089414 申请日期 1999.03.30
申请人 SEIKO EPSON CORP 发明人 INOUE SATOSHI;MIYASAKA MITSUTOSHI;YUDASAKA KAZUO;UTSUNOMIYA SUMIO;HIRAIWA TAKU;KITAWADA KIYOBUMI;MATSUEDA YOJIRO
分类号 G02F1/13;G03F7/20;(IPC1-7):G03F7/20 主分类号 G02F1/13
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