发明名称 HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To obtain an image having low fog and less liable to the rise of fog and a change in sensitivity in preservation before exposure by incorporating specified compounds on the side of a substrate having photosensitive silver halide. SOLUTION: The heat developable photosensitive material contains at least one compound of the formula and at least one selected from a thiosulfonic acid compound, a benzotriazole compound and a mercapto compound on the side of the substrate having photosensitive silver halide. In the formula, X is O or =NH, R1 and R2 are each H, acyl, hydrocarbon or carbamoyl, and when X is O, at least one of R1 and R2 is H, and L1 is a divalent organic group required to form a cyclic structure. A polymer latex having -30 to +40 deg.C glass transition temperature is preferably used as >=50 wt.% of a binder.
申请公布号 JP2000284400(A) 申请公布日期 2000.10.13
申请号 JP19990087300 申请日期 1999.03.29
申请人 FUJI PHOTO FILM CO LTD 发明人 GOTO TAKAHIRO
分类号 G03C1/498;(IPC1-7):G03C1/498 主分类号 G03C1/498
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