发明名称 ACID DIP FOR ZINC-MANGANESE ALLOY ELECTRODEPOSITION
摘要 <p>The invention relates to a dip comprising an acid aqueous solution having no ammonium ion, fluoroborate ions or citrate ion and containing per litre: between 10 and 60g of Zn2+ ions and between 20 and 100g of Mn2+ ions. Said invention is characterised in that it comprises a buffer agent that maintains the pH at a value of between 3 and 7, preferably between 4.5 and 6 or better still between 4.8 and 5.5, and another agent, different from the buffer agent, which is used to bring together the deposition potentials of couple Zn/Zn2+ and couple Mn/Mn2+. The inventive dip is used to deposit a Zn and Mn alloy by electrolysis.</p>
申请公布号 WO2002063071(A2) 申请公布日期 2002.08.15
申请号 FR2002000459 申请日期 2002.02.06
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