| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processor which effectively prevents an atmosphere in a substrate processing part from diffusing out of the processor. SOLUTION: The substrate processor comprises an indexer 21 for carrying in/out a plurality of substrates W housed in cassettes, four substrate processing parts 24 for processing the substrates W with a treating liquid, and a pair of transporting mechanisms 22, 23 for transporting the substrates W. The blowing powers of blowers 25, 26, 27 and the exhaust powers of exhaust pipes in the substrate processor are adjusted so that the gas pressure in each of process chambers 12 is the lowest, the gas pressure in each of second chambers surrounding the process chambers 12 and the transport mechanism 23 is lower, and the gas pressure in the indexer 21 and near the transport mechanism 22 is approximately equal to that in a clean room in which the substrate processor is installed.
|
