| 摘要 |
PROBLEM TO BE SOLVED: To provide a pre-processing method for an abrasive pad, which reduces a time until a prescribed polishing speed is obtained and stabilized when a new pad is mounted, that is a time required for break-in process, resulting in the increased operating rate of a chemical-mechanical polishing device. SOLUTION: The abrasive pad for a chemical-mechanical polishing process is pre-processed by soaking in a hydrophilic processing fluid for a prescribed time before it is mounted onto the chemical-mechanical polishing device. |
