RESIST TREATING METHOD

摘要

PURPOSE: A resist treating method is provided to rapidly clean double sides of an object to be processed and improve throughput by coping with various treating processes included in a photolithography process. CONSTITUTION: A carrier station(3) loads/unloads a carrier(2) in which the object to be processed is stored. A convey mechanism conveys an object taken out from the carrier station. At least one cleaning mechanism cleans the object, arranged along a convey path(6) on which the convey mechanism conveys the object. An object reversing mechanism(10) reveres the object, arranged along the convey path.