| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma generating device to generate plasma for a large area as plasma having uniformity of density and high density. SOLUTION: Plural wave guides 42, 43, 44 are disposed side by side at an equal interval in a plasma generating chamber 11, and coupling holes 42a-42c, 43a-43c, 44a-44c having coupling factors increased one by one as they go toward the tip side are formed in each wave guide. In addition, a dielectric window 45 dividedly formed corresponding to each coupling hole is provided, and microwave power radiated from the inside of the plasma generating chamber 41 is uniformed. Thereby, plasma for a large area is produced as plasma having uniformity of density and high density. |
