摘要 |
<p>PURPOSE:To enable the inexpensive soda lime glass, borosilicate glass, etc., to be used as the glass substrate of the active matrix type liquid crystal display device. CONSTITUTION:A non-doped amorphous silicon layer 23 which is formed over the entire surface and an amorphous silicon layer 26 which is doped with phosphorus at a high concn. are selectively etched with a photoresist 27 as a mask, by which semiconductor active layers and contact layers of TFTs are formed. An SiO2 film and Ta2O5 film 13 are successively formed over the entire surface of the glass substrate 11 for which the soda lime glass or borosilicate glass is used, by which the etchant resistant ability to the amorphous etchant of this stage is imparted to the substrate and, therefore, the degradation in the display quality by etching of the glass substrate 11 is prevented.</p> |