发明名称 A semiconductor device having a hollow around a gate electrode and a method for producing the same
摘要 <p>A semiconductor device operating at a high frequency, includes: a semiconductor layer; a first electrode for being applied with a voltage to control a current flowing in the semiconductor layer; a second electrode and a third electrode electrically connected to the semiconductor layer, at least one of the second and third electrodes being elongated above the first electrode to form a hollow around the first electrode by surrounding the first electrode with the second and third electrodes and the semiconductor layer; a passivation film formed over the second and third electrodes; and wherein the first electrode is directly in contact with an atmosphere in the hollow. <IMAGE> <IMAGE></p>
申请公布号 EP0595298(B1) 申请公布日期 1998.01.14
申请号 EP19930117419 申请日期 1993.10.27
申请人 MATSUSHITA ELECTRONICS CORPORATION 发明人 OISHI, YOSHIRO;UEDA, DAISUKE
分类号 H01L21/338;H01L23/482;H01L23/522;H01L29/06;H01L29/417;H01L29/812;(IPC1-7):H01L29/812;H01L29/41 主分类号 H01L21/338
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