发明名称 NARROW GLOW DISCHARGE CONTROLLING METHOD IN PULSE MODE FOR GLOW DISCHARGE TREATMENT, TREATING TEMPERATURE CONTROLLING METHOD, AND THE NARROW GLOW DISCHARGE TREATING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a device capable of obtaining optimum narrow glow discharge by using a high gas pressure in a pulse mode, attaining the automation of the temp. control of treating temp. and the automation of the prevention and control of its transfer into arc discharge caused by the fluctuation of the gas pressure and clarifying the setting procedure of discharge treating parameters such as pulse peak current value, pulse width, pulse frequency or the like and the correlation thereamong. SOLUTION: As for the setting of the material of an object to be treated (S1), the setting of nitriding specifications (S2), the setting of the dimensions and shape of the object to be treated (S3), the setting of the weight, thickness and treating surface area therein (S4) and the setting of treating parameters (S5), they are set similarly to the conventional cases, thereafter, the pulse frequency Fp is set based on the previously set pulse frequency characteristics (S6), and, the pulse width TW is set based on the previously set pulse frequency/pulse width characteristics (S7). Then, finally, based on the previously set gas pressure/peak current characteristics, the pulse peak current value Ip is set.
申请公布号 JP2000045061(A) 申请公布日期 2000.02.15
申请号 JP19980210838 申请日期 1998.07.27
申请人 PASCAL KK 发明人 HOSOKAWA TOMIAKI;OSHIMA MICHI
分类号 C23C8/36;C23C16/50;C23C16/515;(IPC1-7):C23C8/36 主分类号 C23C8/36
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