发明名称 |
Plasma processing apparatus, matching box, and feeder |
摘要 |
In a plasma processing apparatus, in a matching circuit intervening between a high-frequency power source and a plasma excitation electrode for achieving impedance matching between the high-frequency power source and the plasma excitation electrode, one of the two electrodes which form a tuning capacitor also serves as the plasma excitation electrode. Alternatively, in a plasma processing apparatus, the side wall of a housing made from an electrically conductive member and accommodating a matching circuit intervening between a high-frequency power source and a plasma excitation electrode for achieving impedance matching between the high-frequency power source and the plasma excitation electrode and a feeder for supplying high-frequency electric power from the high-frequency power source to the plasma excitation electrode through the matching circuit is formed not in parallel to the feeder.
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申请公布号 |
US6155202(A) |
申请公布日期 |
2000.12.05 |
申请号 |
US19980199944 |
申请日期 |
1998.11.25 |
申请人 |
ALPS ELECTRIC CO., LTD.;FRONTEC INCORPORATED;OHMI, TADAHIRO |
发明人 |
NAKANO, AKIRA;KIM, SUNG CHUL;FUKUDA, KOICHI;TAKEDA, YASUHIRO;KASAMA, YASUHIKO;OHMI, TADAHIRO;ONO, SHOICHI |
分类号 |
H01J37/32;(IPC1-7):C23C16/00;H01J7/24;H01J21/00 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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