发明名称 SUBSTRATE BONDING METHOD, AND 3-D SEMICONDUCTOR DEVICE
摘要 <p>PURPOSE: A method for bonding a substrate is provided to avoid the peeling problem caused by gas generation and to form a strong and firm bonding event though materials which relatively occurs creates relatively a large amount of gas in thermal curing. CONSTITUTION: A method for bonding a substrate comprises a step of inserting a precursor layer of adhesive layer between bonded substrates and heating the precursor layer. A substrate is formed with a gas-permeable layer on the side contacting the substrate with the adhesive layer precursor of one or both substrates is are used. The gas permeability layer forms a coating layer containing a silicon material and imparts gas permeability by heating the coating film.</p>
申请公布号 KR20100021354(A) 申请公布日期 2010.02.24
申请号 KR20090067157 申请日期 2009.07.23
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 YAGIHASHI FUJIO;HAMADA YOSHITAKA;ASANO TAKESHI
分类号 C09J163/00;C09J201/00;H01L21/301;H01L21/52 主分类号 C09J163/00
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