发明名称 |
SUBSTRATE BONDING METHOD, AND 3-D SEMICONDUCTOR DEVICE |
摘要 |
<p>PURPOSE: A method for bonding a substrate is provided to avoid the peeling problem caused by gas generation and to form a strong and firm bonding event though materials which relatively occurs creates relatively a large amount of gas in thermal curing. CONSTITUTION: A method for bonding a substrate comprises a step of inserting a precursor layer of adhesive layer between bonded substrates and heating the precursor layer. A substrate is formed with a gas-permeable layer on the side contacting the substrate with the adhesive layer precursor of one or both substrates is are used. The gas permeability layer forms a coating layer containing a silicon material and imparts gas permeability by heating the coating film.</p> |
申请公布号 |
KR20100021354(A) |
申请公布日期 |
2010.02.24 |
申请号 |
KR20090067157 |
申请日期 |
2009.07.23 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
YAGIHASHI FUJIO;HAMADA YOSHITAKA;ASANO TAKESHI |
分类号 |
C09J163/00;C09J201/00;H01L21/301;H01L21/52 |
主分类号 |
C09J163/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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