PLASMA PROCESSING METHOD AND DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a plasma processing method and device using a high frequency power source, wherein impedance matching is optimized. SOLUTION: An impedance measuring device 6 by which the impedance at the transmission path between an electrode 2 on the load side in the middle of plasma discharge and an impedance matching device 3 can be measured is arranged and the result of the measured impedance is feed-backed to an impedance controlling device 7, so that the inductance component generated between the transmission path is held to a minimum and the loss in electric power is held to a minimum.