发明名称 COMPOUND SEMICONDUCTOR DEVICE WITH LAMINATED CHANNEL LAYER
摘要 A compound semiconductor device having a channel layer which is made of periodically laminated structure of thin-film layers of compound semiconductor substantially being different from each other. The difference of energy between the conduction band and the valence band of compound semiconductor thin-film layers of one side is less than that of the other side thin-film layers, moreover the electron mobility in low electric field application in the thin-film layers of compound semiconductor of one side is greater than that of the other side thin-film layers, besides the electron mobility in high electric field application in the thin-film layers of compound semiconductor of one side is less than that of the other side thin-film layers, and/or the impact ionization of valence electron generated in high electric field application takes place earlier than the thin-film layers of compound semiconductor of the other side. While conduction electrons preferentially flow through the thin-film layers of compound semiconductor of one side in low electric field application, and conversely, while conduction electron having substantial energy intensified by acceleration preferentially flow through other side thin-film layers in high electric field application.
申请公布号 CA1277440(C) 申请公布日期 1990.12.04
申请号 CA19870535564 申请日期 1987.04.24
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 MATSUI, YUICHI
分类号 H01L29/812;H01L21/203;H01L21/285;H01L21/338;H01L29/15;H01L29/45;H01L29/778 主分类号 H01L29/812
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