发明名称 Multi-2DEG HEMT
摘要 A high electron mobility field effect semiconductor device includes a layer stack including electron supply layers and electron transport layers to form a plurality of hetero-junctions so as to provide 2DEG layers in hetero-interfaces on the electron transport layer side, a source electrode and a drain electrode disposed with an interval on a surface of the layer stack to oppose each other and to be conductive to the 2DEG layers, and a gate electrode extending between the source and drain electrodes to develop a Schottky contact with the upper-most carrier supply layer. The electron supply layer remote from the gate electrode has an electron density higher than that of the electron supply layer less remote from the gate electrode.
申请公布号 US5473175(A) 申请公布日期 1995.12.05
申请号 US19930115322 申请日期 1993.09.02
申请人 FUJITSU LIMITED;FIJITSU QUANTUM DEVICES LIMITED 发明人 NIKAIDO, JUN-ICHIRO;MINIMO, YUTAKA
分类号 H01L29/812;H01L21/338;H01L29/10;H01L29/778;(IPC1-7):H01L29/812 主分类号 H01L29/812
代理机构 代理人
主权项
地址