| 摘要 |
A pair of impurity regions are formed at a specified interval in a semiconductor substrate. A channel region is defined between the impurity regions. A select gate is provided on the channel region, and a sidewall for holding electric charge is provided along a side of the select gate. A tunnel insulating film is interposed between the sidewall for holding electric charge and the channel region. An insulating film covers the sidewall for holding electric charge. A control gate is provided on the insulating film lying over the sidewall. In such a structure, since the select gate can have a large cross-sectional area, speed-up of the reading can be attained.
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