| 摘要 |
PROBLEM TO BE SOLVED: To freely etch a pattern of a mnicromechanism made from a metallic layer, without corrosion. SOLUTION: To protect a metallic layer 3 for micromechanisms, such as sensors or actuators from an etchant for etching hollows 9, e.g., in an Si dioxide victim layer 1, the layer 3 is enclosed with, e.g., a TiN protective layer. An auxiliary protective layer 5 in etching holes 8 for etching the hollows 9 is deposited in the same shape as a layer at the top and bottom of a protective layer 7 and is anisotropically etched back to cover also the sides of the metallic layer 3 with the protective layer 7. |
