发明名称 |
Low vacuum vapor process for producing epitaxial layers |
摘要 |
A method for fabricating composite articles with an epitaxial layer is described. The method can be performed under conditions of relatively high pressure and low substrate surface temperature. The resulting epitaxial layers can demonstrate various advantageous properties, such as low pore density and/or inclusions with small average particle size diameter. |
申请公布号 |
AU9572898(A) |
申请公布日期 |
1999.04.12 |
申请号 |
AU19980095728 |
申请日期 |
1998.09.21 |
申请人 |
AMERICAN SUPERCONDUCTOR CORPORATION |
发明人 |
LESLIE G. FRITZEMEIER;DAVID M. BUCZEK |
分类号 |
C04B35/00;C30B23/02;C30B25/02;C30B25/14;H01L39/24 |
主分类号 |
C04B35/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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