| 发明名称 |
Carboxyl-containing alicyclic monomers for photoresist resins |
| 摘要 |
Carboxyl-containing alicyclic compounds represented by Chemical Formula 1 : [Chemical Formula 1] wherein R 1 and R 2 , which may be identical to or different from each other, represent hydrogen or a tert-butyl group; X represents hydrogen, hydroxy or oxygen; and n represents a number from 1 to 3, are useful as monomers for a photoresist resin.
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| 申请公布号 |
GB2336843(A) |
申请公布日期 |
1999.11.03 |
| 申请号 |
GB19990009922 |
申请日期 |
1999.04.30 |
| 申请人 |
* HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. |
发明人 |
GEUN SU * LEE;JAE CHANG * JUNG;MIN HO * JUNG;CHEOL KYU * BOK;KI HO * BAIK |
| 分类号 |
C07C57/26;C07C59/46;C07C59/80;C07C69/608;C07C69/732;C07C69/738;C08F22/06;C08F32/00;C08G61/08;G03F7/004;G03F7/027;G03F7/039;(IPC1-7):C07C57/26;C07C69/73 |
主分类号 |
C07C57/26 |
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