发明名称 |
Semiconductor exposure apparatus and method of driving the same |
摘要 |
A semiconductor exposure apparatus includes a light exposure portion irradiating light on a semiconductor wafer through a reticle; a pellicle particle detector detecting a particle existing on a surface of the reticle; a particle cleaner cleaning the reticle when the particle exists on the surface of the reticle; a robot arm moving the reticle to a desired location in response to a control signal generated from a main controller; and the main controller controlling an operation of the semiconductor exposure apparatus.
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申请公布号 |
US2002176060(A1) |
申请公布日期 |
2002.11.28 |
申请号 |
US20020147581 |
申请日期 |
2002.05.17 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK SOON-JONG |
分类号 |
H01L21/027;G03F1/00;G03F7/20;(IPC1-7):G03B27/42 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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