DEVELOPABLE PHOTO-CURABLE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a developable photo-curable composition useful as a photoresist composition excellent in photosensitivity. SOLUTION: The photo-curable composition is obtained by adding 0.01-20 parts by mass of a photopolymerization initiator (C) to 100 parts by mass of a blend comprising 5-40 mass % crosslinked fine particles (A) having 10-1,000 nm average primary particle diameter obtained by polymerizing a compound (a1) having one or two radical polymerizable ethylenically unsaturated bonds in one molecule and a compound (a2) having >=3 (meth)acryloyl groups in one molecule and 95-60 mass % compound (B) having a (meth)acryloyl group in its molecule.