| 摘要 |
<p>PROBLEM TO BE SOLVED: To easily deal with the surface shape to be obtained, to easily deal with the adjacent effects of light transmission quantities between unit cells and to enhance the degrees of freedom in design as well. SOLUTION: The density distribution mask is used for exposure for the purpose of forming photosensitive material patterns when an article having a surface shape of a three-dimensional structure is manufactured by forming the photosensitive material patterns of the three-dimensional structure on a substrate and transferring the photosensitive material patterns by engraving to the board. The mask described above is obtained by forming shading patterns having a two-dimensional light intensity distribution on the transparent substrate. The density distribution mask is closely divided by plural kinds of unit cells at suitable shapes and sizes and the shading patterns within the respective unit cells are so set as to attain the light transmission quantities or shading quantities meeting the heights of the corresponding to positions of the photosensitive material patterns.</p> |
