发明名称 |
METHOD AND DEVICE FOR TREATING GAS |
摘要 |
PROBLEM TO BE SOLVED: To efficiently treat a gas to be treated such as a per-fluorinated compound(PFC) with simple equipment by using the chemical reaction with plasma. SOLUTION: A rotary electrode 18 and a flat electrode 17 or one more rotary electrode are arranged at a prescribed interval to face each other. The chemical reaction using the plasma 22 is performed by rotating the rotary electrode 18, applying voltage between both electrodes 17 and 18 to generate the plasma 22, simultaneously introducing the gas to be treated and a reaction gas into a chamber and involving the gases in the plasma 22 with the rotation of the rotary electrode 18. |
申请公布号 |
JP2002028441(A) |
申请公布日期 |
2002.01.29 |
申请号 |
JP20000216341 |
申请日期 |
2000.07.17 |
申请人 |
KOBE STEEL LTD;MORI YUZO |
发明人 |
HAYASHI KAZUYUKI;KOBAYASHI AKIRA;NAKAGAMI AKIMITSU;INOUE KENICHI;OKADA KAZUTO;ISHIBASHI KIYOTAKA;MORI YUZO |
分类号 |
H05H1/24;B01D53/34;B01D53/56;B01D53/62;B01D53/68;B01D53/70;B01D53/72;B01J19/08;H01L21/205 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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