| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a mask holder for the charged particle beam exposure, which mounts/fixes a mask on a mask holder at a proper plane accuracy and mounts a mask on a mask holder with very little foreign substances deposited on the mask surface, i.e., a charged particle beam irradiating surface. SOLUTION: The mask holder for the charged particle beam exposure comprises openings provided, according to an opening pattern of a charged particle beam exposure mask, a charged particle beam irradiating holder member, a charged particle beam emission holder member for sandwiching the mask and recesses in contact portions of the irradiation holder member or the irradiation holder member and the emission holder member with the exposure mask. Or the mask holder comprises holes deeper than the recesses or through-holes, at least in the contact portions of the irradiation holder member with peripheral corners of the mask.</p> |
