发明名称 PLASMA PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a plasma processing method which can do a surface processing evenly all over the inner surface of a member. SOLUTION: The inside of insulation member 1, which has a gas barrier feature, is filled with gas 2, and the insulation member 1 is sealed airtightly. By irradiating the insulation member 1 with an electro-magnetic wave 4, the gas 2 filled inside the insulation member 1 is activated. The activated gas 2 is generated all over the inner part of the insulation member 1, and the gas 2, which is activated, is made to reach and brought into contact with all over the inner surface of the insulation member 1.
申请公布号 JP2002346493(A) 申请公布日期 2002.12.03
申请号 JP20010159097 申请日期 2001.05.28
申请人 MATSUSHITA ELECTRIC WORKS LTD 发明人 SAWADA KOJI
分类号 H05H1/46;A61L2/14;B01J19/08;B08B7/00;B08B9/20 主分类号 H05H1/46
代理机构 代理人
主权项
地址
您可能感兴趣的专利