发明名称 PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a plasma device that is free from an uneven surface distribution of object processing speeds and has high uniformity in processing speed. SOLUTION: A dielectric window 2 is made of dielectric plates 13a, 21a, 23a, 24a and 25a, each one side of which is connected to a coaxial conversion antenna 4, and conductive plate members 14, 14a, 14b, 14c, 22a, 22b, 22c and 22d, which are in contact with the other side of the dielectric plates 13a, 21a, 23a, 24a and 25a, and are formed into an axially symmetric shape with respect to the center of the dielectric window 2.
申请公布号 JP2002329709(A) 申请公布日期 2002.11.15
申请号 JP20010129703 申请日期 2001.04.26
申请人 TOSHIBA CORP 发明人 SANGA MASASHI;NIIMURA TADASHI;IYANAGI KATSU
分类号 H05H1/46;B01J19/08;H01L21/302;H01L21/3065;H01L21/31 主分类号 H05H1/46
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