发明名称 FILM FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a film forming apparatus for controlling a temperature rise in a reaction chamber during forming a DLC(diamond-like carbon) film, along with continually forming the film without stopping plasma discharge, even when a power protection circuit is actuated during forming the DLC protective film. SOLUTION: The film forming apparatus 10 has a reaction chamber 16 for forming a DLC protective coating on a magnetic film provided on a support 12, with a plasma reaction in a vacuum chamber 20. The reaction chamber 16 comprises an external cylinder 31, of which the top is opened and the inner wall 31A and 30A are coated with insulated materials 35 and 32, and an internal cylinder 30 inside the external cylinder 31. In the external cylinder 31, a cooling means 36 is arranged on an external wall 31B. In the internal cylinder 30, several ignition electrodes 25A and B which are sequentially disposed along a traveling direction of the support 12, are accommodated. Each of discharge electrodes 25A and B is independently connected to each of different power sources 27A and B.
申请公布号 JP2002327272(A) 申请公布日期 2002.11.15
申请号 JP20010135003 申请日期 2001.05.02
申请人 SONY CORP 发明人 SATO TAKETOSHI;HIRATSUKA RYOICHI;WATANABE TAKASHI;KONISHI TOSHIHIRO;ABE ATSUHIRO
分类号 H05H1/46;B01J19/08;C23C16/27;C23C16/503;G11B5/84 主分类号 H05H1/46
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