发明名称 PLASMA TREATMENT APPARATUS AND PLASMA TREATMENT METHOD
摘要 PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus capable of achieving stable glow discharge. SOLUTION: A discharge gas is introduced between a pair of electrodes 2, 3, arranged in parallel and facing to each other, and at the same time, voltage is applied between a pair of the electrodes 2, 3, thereby causing glow discharge under a pressure close to atmospheric pressure. For the plasma treatment apparatus, an object 4 to be treated is introduced between a pair of the electrodes 2, 3, thereby subjecting the object 4 to be treated to plasma treatment. The sections of a pair of the electrodes 2, 3 are formed in a substantially rectangular form, and a curvature is provided at each of corners of the electrodes 2, 3. A dielectric is provided between a pair of the electrodes 2, 3. Plural pairs 70 of electrodes each formed by a pair of the electrodes 2, 3, arranged at an interval 71 between adjacent pairs 70 of electrodes. A discharge gas can be introduced between the electrodes 2, 3 which are arranged facing to each other through the interval 71 between adjacent pairs 70 of electrodes.
申请公布号 JP2002353000(A) 申请公布日期 2002.12.06
申请号 JP20010154490 申请日期 2001.05.23
申请人 MATSUSHITA ELECTRIC WORKS LTD 发明人 SAWADA KOJI;TAGAWA TOSHIYUKI;NAKAZONO YOSHIYUKI
分类号 H05H1/46;B01J19/08;C22B9/22 主分类号 H05H1/46
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