发明名称 |
POSITIVE TYPE RESIST COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a positive type resist composition exhibiting sufficient transmittance at the time of using a light source of 157 nm and having satisfied coating property and development defect. SOLUTION: The positive resist composition contains (A) a resin, which has at least one repeating unit having a structure of general formula (1) and is decomposable by the action of an acid to increase the solubility to an alkali developer and (B) a compound generating the acid by the irradiation with active ray or radiation. |
申请公布号 |
JP2002351081(A) |
申请公布日期 |
2002.12.04 |
申请号 |
JP20020074337 |
申请日期 |
2002.03.18 |
申请人 |
FUJI PHOTO FILM CO LTD |
发明人 |
AOSO TOSHIAKI;MIZUTANI KAZUYOSHI;KANNA SHINICHI |
分类号 |
G03F7/039;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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