发明名称 DEVICE AND METHOD FOR RECOGNIZING LOCATION OF SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a device and a method for recognizing the location of a substrate, capable of recognizing the place without requiring additional recognition marks. <P>SOLUTION: In the recognition of the place of the substrate that cannot be entirely housed in a photographable region, only a recognizing mark 2a on one side is housed in the photographable region and is imaged first, the substrate 2 is moved in the substrate-carrying direction (a) and the recognizing mark 2b on the other side is housed in the photographable area, and the imaging is carried out. The true positional relation of the recognizing marks 2a and 2b can be recognized, by adding the movement of the substrate 2 to the positional relation of the recognizing marks 2a and 2b image-sensed when the substrate 2 is positioned at other places, respectively, thus allowing recognition of the location of the substrate 2. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008210927(A) 申请公布日期 2008.09.11
申请号 JP20070045079 申请日期 2007.02.26
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 MOTAI MICHIAKI;SASAKI AKISUKE
分类号 H05K13/04 主分类号 H05K13/04
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