| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition for liquid immersion exposure having satisfactory lithography characteristics and preferable hydrophobic properties for liquid immersion exposure and a resist pattern forming method. <P>SOLUTION: The positive resist composition for liquid immersion exposure includes: a base material member component (A) having solubility in alkaline developing solution increased with the action of an acid; an acid generator component (B) generating an acid by exposure; and a macromolecular compound (C) having an aromatic cyclic group having a fluorine atom at a side chain. <P>COPYRIGHT: (C)2009,JPO&INPIT |
