| 摘要 |
Disclosed is an apparatus to supply fluid, which supplies fluid to a substrate processing system. The apparatus to supply fluid comprises: a gas supply unit comprising: a temperature control unit into which external gas introduced, and which controls the temperature of the gas; a humidity control unit having a humidifying container to control the humidity of the gas; and a wind-blowing unit to supply the gas with the temperature and humidity controlled, which is supplied from the humidity control unit, to the substrate processing system, and a liquid supply unit to control the temperature of liquid and to supply it. The humidifying container comprises: a humidifying heating unit to accommodate the supplied liquid and to heat the liquid; and a humidifying cover placed on top of the humidifying heating unit to have one or more humidifying holes on the top surface. The present invention provides an apparatus to supply fluid and a substrate processing system, which can efficiently use space, efficiently move the flow of gas, and prevent moisture from entering a wind blower. |
