Mn-Zn-W-O SPUTTERING TARGET AND MANUFACTURING METHOD THEREFOR

摘要

Provided are: a Mn-Zn-W-O sputtering target with excellent crack resistance; and a manufacturing method therefor. This Mn-Zn-W-O sputtering target comprises Mn, Zn, W and O in the component composition and is characterized in that in X-ray diffraction of said sputtering target, the ratio PMnO/Pw of the maximum peak intensity PMnO of the peak due to manganese oxide configured from Mn and O only with respect to the maximum peak intensity Pw of the peak due to W is not more than 0.027.