发明名称 Method for producing a silicon single crystal
摘要 A silicon single crystal is produced by a method wherein a silicon plate is inductively heated;granular silicon is melted on the silicon plate; andthe molten silicon thus produced flows through a flow conduit in the center of the plate to a phase boundary at which a silicon single crystal crystallizes, wherein a silicon ring having a lower resistivity than the plate, and lying on the plate, is inductively heated prior to inductively heating the plate, and melting the ring.
申请公布号 US9410262(B2) 申请公布日期 2016.08.09
申请号 US201313969818 申请日期 2013.08.19
申请人 SILTRONIC AG 发明人 Lobmeyer Josef;Brenninger Georg;Stein Waldemar
分类号 C30B13/08;C30B13/20;C30B29/06;C30B13/10 主分类号 C30B13/08
代理机构 Brooks Kushman P.C. 代理人 Brooks Kushman P.C.
主权项 1. A method for producing a silicon single crystal, comprising inductively heating a silicon plate having an outer diameter; melting granular silicon on the silicon plate; and feeding molten silicon through a flow conduit having an inner diameter and located in the center of the plate, to a phase boundary, crystallizing molten silicon at the phase boundary to form a silicon single crystal, wherein a silicon ring lying on the plate and having a lower resistivity than the plate and having an inner and an outer diameter is inductively heated before inductively heating the plate, and melting the ring.
地址 Munich DE