发明名称 |
Method for producing a silicon single crystal |
摘要 |
A silicon single crystal is produced by a method wherein
a silicon plate is inductively heated;granular silicon is melted on the silicon plate; andthe molten silicon thus produced flows through a flow conduit in the center of the plate to a phase boundary at which a silicon single crystal crystallizes, wherein a silicon ring having a lower resistivity than the plate, and lying on the plate, is inductively heated prior to inductively heating the plate, and melting the ring. |
申请公布号 |
US9410262(B2) |
申请公布日期 |
2016.08.09 |
申请号 |
US201313969818 |
申请日期 |
2013.08.19 |
申请人 |
SILTRONIC AG |
发明人 |
Lobmeyer Josef;Brenninger Georg;Stein Waldemar |
分类号 |
C30B13/08;C30B13/20;C30B29/06;C30B13/10 |
主分类号 |
C30B13/08 |
代理机构 |
Brooks Kushman P.C. |
代理人 |
Brooks Kushman P.C. |
主权项 |
1. A method for producing a silicon single crystal, comprising
inductively heating a silicon plate having an outer diameter; melting granular silicon on the silicon plate; and feeding molten silicon through a flow conduit having an inner diameter and located in the center of the plate, to a phase boundary, crystallizing molten silicon at the phase boundary to form a silicon single crystal, wherein a silicon ring lying on the plate and having a lower resistivity than the plate and having an inner and an outer diameter is inductively heated before inductively heating the plate, and melting the ring. |
地址 |
Munich DE |