发明名称 Plasma confinement system
摘要 A plasma confinement system comprising a toroidal vacuum chamber, a toroidal coil which generates a magnetic field in a toroidal direction within the vacuum chamber, current transformer coils which are wound in the toroidal direction, equilibrium magnetic field coils which are wound in the toroidal direction in order to control a plasma, alternating current coils which are wound mainly in the toroidal direction and through which alternating currents are caused to flow for enabling forming and rotating of a deformed magnetic surface and for causing rotation of the plasma in a poloidal direction, and power sources which cause currents to flow through the various coils.
申请公布号 US4863671(A) 申请公布日期 1989.09.05
申请号 US19870056658 申请日期 1987.06.02
申请人 HITACHI, LTD. 发明人 OKADA, OSAMI
分类号 G21B1/11;G21B1/00;H05H1/12 主分类号 G21B1/11
代理机构 代理人
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