TARGET FOR SPUTTERING AND ITS MANUFACTURE,申请号JP19910159130-传众专利搜索

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发明名称	TARGET FOR SPUTTERING AND ITS MANUFACTURE
摘要
申请公布号	JPH0586464(A)	申请公布日期	1993.04.06
申请号	JP19910159130	申请日期	1991.06.28
申请人	MITSUBISHI MATERIALS CORP	发明人	MISHIMA TERUSHI;MASHIMA MUNETAKA;TAMURA JUN
分类号	C23C4/00;C23C14/34	主分类号	C23C4/00
代理机构		代理人
主权项
地址

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