发明名称 Semiconductor device and manufacture method of same
摘要 <p>A semiconductor device has an insulated gate transistor in which source and drain regions are provided in a single crystal semiconductor layer formed on an insulating layer with a channel region interposed between the source and drain regions. An insulating layers just below the source and drain regions are made thicker than an insulating layer just below the channel region. <IMAGE></p>
申请公布号 EP0810652(A2) 申请公布日期 1997.12.03
申请号 EP19970111478 申请日期 1993.01.27
申请人 CANON KABUSHIKI KAISHA 发明人 INOUE, SHUNSUKE;MIYAWAKI, MAMORU;KOHCHI, TETSUNOBU
分类号 H01L21/336;H01L21/762;H01L21/8238;H01L27/06;H01L27/12;H01L29/786;(IPC1-7):H01L21/823 主分类号 H01L21/336
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