发明名称 ELECTRONIC BEAM INTENSITIY DISTRIBUTION MEASURING METHOD
摘要 PROBLEM TO BE SOLVED: To measure the electronic beam intensity distribution of a cathode ray tube at high speed in a manufacturing process by displaying plural patterns used for the measurement of an electronic beam profile and measuring electronic beam intensity by means of overlapping luminous intensity distribution information for the respective patterns. SOLUTION: Plural patterns used in the measurement of an electronic beam profile are displayed and electronic beam intensity is measured by overlapping luminous intensity distribution information for the respective displayed patterns. Auxiliary patterns 6 having areas where the luminance center of sufficient precision can be calculated only by the discrete light emission of fluorescent dots are displayed in accordance with measurement dot patters 7 in addition to the measurement dot patterns 7. Since an interval between the respective measurement dots 7 and the auxiliary patterns 6 is constant, the centroid of the auxiliary patterns 6 is set to be a reference point and the luminous intensity distribution of the respective measurement dot patterns 7 is precisely overlapped.
申请公布号 JP2000184402(A) 申请公布日期 2000.06.30
申请号 JP19980362125 申请日期 1998.12.21
申请人 HITACHI LTD;HITACHI DEVICE ENG CO LTD 发明人 NOZAKI YOSHINAO;OBARA KENJI;MOCHIZUKI ATSUSHI;DOI HIDEAKI;HORIUCHI TATSUO;YAMAMURA HISAE;HOSOYA NAOKI;YOSHIHARA YOSHIO;OSHIMA TAKAO;SHIMANO YOICHI;HORIE KENICHI;KASAGI KUNINORI
分类号 H01J9/42;H04N17/04;(IPC1-7):H04N17/04 主分类号 H01J9/42
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